Grahame Rosolen was born in Orange, Australia. He holds BSc and BE degrees from the University of Sydney and a PhD from the University of Cambridge. His PhD research topic in Cambridge was the “Development of a Combined Scanning Electron Microscope and Scanning Tunnelling Microscope for Nanotechnology Applications”. He has worked for Austek Microsystems in the design of custom VLSI integrated circuits and for the University of New South Wales and Cambridge Instruments (UK) developing advanced electron beam lithography instruments for fabricating and imaging nanostructures.
 
Grahame's research interests include developing specialised electron beam equipment, nanotechnology and imaging instrumentation. He has extensive experience in nanofabrication and nanopatterning using purpose built electron beam lithography equipment. He has authored many papers in the area of electron beam lithography and nanofabrication and holds international patents related to the design of electron beam lithography equipment. His research work in nanofabrication has involved the manufacture of optical, electronic and optoelectronic devices and he is also active in the development of specialised lithography instruments and novel fabrication processes. Grahame is currently working in the areas of electron beam lithography instrumentation and applications and also passive millimetre-wave imaging.

1. Bachelor of Science (Pure Mathematics & Physics), University of Sydney

2. Bachelor of  Engineering (Electrical, 1st Class Honours), University of Sydney

3. PhD, University of Cambridge